• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    The invention relates to an electrostatic chuck barrier seal (10) in the plasma etching process. The barrier seal includes multiple sealing portions for blocking the bonding layer (12) of the electrostatic mandrel (10) and the plasma gas. The groove (14) of the electrostatic chuck (10) can be completely filled by the barrier seal. Even if one of the multiple sealing parts is destroyed by the plasma gas, the barrier seal still effectively prevents leakage of the electrostatic chuck (10). The barrier seal provides a buffer period for engineers to replace the damaged barrier seal before the leak occurs. A leakage hazard caused by a sudden rupture of the barrier seal is reduced. In addition, the barrier seal facilitates the stability and safety of the plasma etching process. The output of the products made by the electrostatic chuck (10) can be improved.
    公开号:FR3032768A1
    申请号:FR1650865
    申请日:2016-02-03
    公开日:2016-08-19
    发明作者:Yo-Yu Chang；Chun-Yao Huang
    申请人:MFC Sealing Tech Co Ltd；
    IPC主号:
    专利说明:

    [0001] TECHNICAL FIELD The present invention relates to a barrier seal for use with an electrostatic chuck in plasma etching equipment, and more particularly to a barrier seal which can be mounted in a groove of the electrostatic chuck with multiple parts of the electrostatic chuck. sealing. Conventional plasma etching equipment is shown in FIG. 9. The plasma etching equipment comprises an electrostatic chuck 90. The electrostatic chuck 90 comprises an upper element 91 which is made of dielectric ceramic materials, a lower element 92 and a flexible connecting layer 93. The connecting layer 93 is connected to the upper element 91 and to the lower element 92. The electrostatic mandrel 90 further comprises an extension element 100 around the electrostatic mandrel 90. There is a 110 and a groove 113 between the electrostatic chuck 90 and the extension member 100. A plasma gas 120 may flow into the gap between the electrostatic chuck 90 and the extension member 100 through the gap. 110, and the plasma gas 120 further enters the groove 113 and destroys the bonding layer 93 to induce erosion of the electrostatic mandrel 90 and a vanishing point in the process plasma etching. The working fluid in the electrostatic chuck 90 may flow out of the electrostatic chuck 90 through the vanishing point and induce environmental pollution.
    [0002] In order to solve said problems, the epoxy resin arrangement 130 in the groove 113 is known in the art, as shown in FIG. 10. The groove 113 is filled with the epoxy resin 130 to prevent damage to the coating layer. However, the epoxy resin 130 is easily eroded and becomes thinner with the plasma gas 120. After a long-term plasma etching, a vanishing point is formed and the epoxy resin 130 loses. gradually its protection function. In addition, the service life of the epoxy resin 130 is difficult to estimate. Engineers may not close the leak point in time before the gas leak occurs.
    [0003] It is also known in the art to provide a replaceable elastomeric ring 140 to replace the epoxy resin 130, as shown in FIG. 11. The elastomeric ring 140 can overcome the problems of the epoxy resin 130 mentioned above. However, there is only one sealing portion 150 between the tie layer 93 and the groove 113. The size of the groove 113 is very small. It is difficult to evenly install the elastomeric ring 140 in the groove 13. Since the elastomeric ring 140 can not be arranged in the groove 113 evenly, it is difficult for the engineers to estimate the service life of the elastomeric ring 140. elastomer ring 140. When the elastomer ring 140 is unable to block the bonding layer 93, the erosion of the bonding layer 93 and pollution will be induced.
    [0004] Numerous problems still exist in sealing the groove 113 of the electrostatic chuck 90 in plasma etching equipment. An object of the present invention is to provide a barrier seal to be disposed in the groove of the electrostatic chuck with multiple sealing portions. The barrier seal of the present invention may not induce gas leakage caused by partial damage to the barrier seal. In addition, the barrier seal provides a buffer period for estimating the life of the barrier seal. Engineers can replace the damaged barrier seal before a leak occurs. The present invention facilitates the stability and safety of the plasma etching process. To achieve the above object, the present invention relates to a barrier seal for use with an electrostatic mandrel comprising an upper member, a lower member, a tie layer connecting the upper member and the lower member. and a groove formed from an outer edge of the tie layer, the upper member and the lower member, the barrier seal being characterized by being an elastomeric ring and comprising a sealing portion 15 and at least one secondary sealing portion protruding outwardly from one side of the main sealing portion, the main sealing portion including at least one edge toward the groove and one side the at least one edge being a chamfered edge. The advantage of the present invention is to use the main sealing portion and the at least one secondary sealing portion to construct two sealing portions to protect the tie layer.
    [0005] If the main sealing portion is eroded by the plasma gas, the at least one secondary sealing portion further blocks the bonding layer and the plasma gas continuously. The gas leakage from the electrostatic chuck does not occur abruptly. The at least one secondary seal portion provides a buffer period for the engineers to replace the damaged barrier seal. The present invention prevents environmental pollution by the working fluid from the electrostatic chuck. The plasma etching process can be safe in the semiconductor industry. The qualities of the products manufactured by the electrostatic chuck can be stable.
    [0006] In particular, the cross-section of the barrier seal may be L-shaped. One side of the main sealing portion toward the groove may include an edge, and the edge is a chamfered edge. The barrier seal may include a first secondary seal portion, which protrudes from an inner side of the main seal portion towards the groove. One side of the first secondary sealing portion towards the groove may comprise two edges, the two edges being chamfered edges. The advantage of the present invention is to use the L-shaped barrier seal to fit the L-shaped groove of the electrostatic chuck. The chamfered edges of the main sealing portion and the first secondary sealing portion help the elastomeric ring to be easily disposed in the groove. Thus, the groove can be fully filled and sealed by the elastomeric ring. The electrostatic chuck is not prevented from functioning because damage to the elastomeric ring occurs abruptly. More particularly, the barrier seal may comprise at least a second secondary sealing portion. The at least one second secondary sealing portion projects from an outer side of the main sealing portion in a direction away from the groove. The at least one second secondary sealing portion may include a chamfered edge in a direction away from the groove. The advantage of the present invention is to use the main sealing portion, the at least one secondary sealing portion, and the at least one second secondary sealing portion to construct three sealing portions. to protect the bonding layer. The gap between the electrostatic chuck and the extension member may be closed by the at least one second secondary sealing portion. The present invention is more effective in preventing plasma gas from entering the gap in the groove 10 and destroying the tie layer. In particular, the cross-section of the barrier seal may be T-shaped. One side of the main sealing portion in the direction of the groove may comprise two edges, the two edges being chamfered edges. The barrier seal may include a first secondary sealing portion, which protrudes from an inner side of the main sealing portion toward the groove. One side of the first secondary sealing portion in the direction of the groove may comprise two edges, the two edges being chamfered edges. The advantage of the present invention is to use the T-shaped barrier seal to fit the T-shaped groove of the electrostatic chuck. The chamfered edges of the main sealing portion and the first secondary sealing portion help the elastomeric ring to be easily disposed in the groove. Thus, the groove can be fully filled and sealed by the elastomeric ring. The electrostatic chuck is not prevented from functioning due to the fact that damage to the elastomeric ring occurs abruptly. More particularly, the barrier seal may comprise at least a second secondary seal portion. The at least one second secondary sealing portion projects from an outer side of the main sealing portion in a direction away from the groove. The at least one second secondary seal portion may include a chamfered edge opposite the groove. The advantage of the present invention is to use the main sealing portion, the at least one secondary sealing portion, and the at least one second secondary sealing portion to construct three sealing portions for protect the bonding layer. The gap between the electrostatic chuck and the extension member may be closed by the at least one second secondary sealing portion. The present invention is effective in preventing plasma gas from entering the gap into the groove and destroying the tie layer. More particularly, the barrier seal may further comprise a third secondary sealing portion, particularly for replacing the at least one second secondary sealing portion. The third secondary sealing portion projects from an outer side of the main sealing portion in a direction away from the groove. A height of the third secondary sealing portion is greater than a height of the main sealing portion, and the third secondary sealing portion is in contact with the upper member and the lower member of the electrostatic mandrel. , respectively. One side of the main sealing portion in the direction of the groove may comprise two edges, the two edges being chamfered edges, and the barrier seal further comprises a third secondary sealing portion, which protrudes from the groove 3032768 on an outer side of the main sealing portion in a direction away from the groove, a height of the third secondary sealing portion being greater than a height of the main sealing portion, and the The third secondary sealing portion being in contact with the upper member and the lower member of the electrostatic mandrel, respectively. The advantage of the present invention is to use the third secondary sealing portion to replace the at least one second secondary sealing portion. In addition, the advantage of the present invention is to also use the main sealing portion, the at least one secondary sealing portion and the third secondary sealing portion to construct three sealing portions to protect the bonding layer. The gap between the electrostatic chuck and the extension member may be closed and partially filled by the third secondary sealing portion. The present invention is effective at resisting erosion by plasma gas. The present invention will become more apparent upon reading the following description of particular embodiments of the present invention with reference to the accompanying drawings.
    [0007] In these drawings: FIG. 1 is a schematic view of the first embodiment of the barrier seal disposed on the groove of an electrostatic chuck according to the present invention; - Figure 2 is a schematic view of the second embodiment of the barrier seal disposed on the groove 3032768 8 of an electrostatic chuck according to the present invention; Figure 3 is a schematic view of the third embodiment of the barrier seal disposed on the groove of an electrostatic chuck according to the present invention; Figure 4 is a schematic view of the fourth embodiment of the barrier seal disposed on the groove of an electrostatic chuck according to the present invention; Figure 5 is a schematic view of the fifth embodiment of the barrier seal disposed on the groove of an electrostatic chuck according to the present invention; Figure 6 is a schematic view of the sixth embodiment of the barrier seal disposed on the groove of an electrostatic chuck according to the present invention; Figure 7 is a schematic view of the seventh embodiment of the barrier seal disposed on the groove of an electrostatic chuck according to the present invention; Figure 8 is a schematic view of the eighth embodiment of the barrier seal disposed on the groove of an electrostatic chuck according to the present invention; Figure 9 is a schematic view of a conventional electrostatic chuck of plasma etching equipment; Figure 10 is a schematic view of filling the groove of a conventional electrostatic chuck with an epoxy resin; Figure 11 is a schematic view of a replaceable elastomeric ring disposed on the groove of a conventional electrostatic chuck. A barrier seal of the present invention is used for a sidewall of an electrostatic chuck 10. Referring to FIG. 1, it can be seen that the electrostatic chuck 10 comprises an upper member 11, a tie layer 12 and a lower member 13. The upper member 11 has a lower portion 111 and an upper portion 112. A diameter 20 of the lower portion w is smaller than a diameter W of the upper portion. The tie layer 12 is connected to the lower portion 111 of the upper member 11 and the lower member 13. A groove 14 is formed around an outer surface of the tie layer 12. The groove 14 is also between the upper member 11 and the lower member 13. Before filling the groove 14 with the barrier seal, a portion of the outer bonding layer 12 is removed to a depth D and a diameter w '. The diameter w 'of the tie layer is smaller than the diameter w of the lower portion. Thus, the cross section of the groove 14 is a shape of L with reference to Figures 1 and 2.
    [0008] Referring to Figure 1, it can be seen that the first embodiment of the barrier seal is an elastomeric ring 20. The cross section of the elastomeric ring 20 is L-shaped, and the elastomeric ring 20 is 5 has a shape corresponding to the groove 14. The elastomeric ring 20 comprises: a main sealing portion 21 and a first secondary sealing portion 22. The main sealing portion 21 towards the groove 14 further comprises a The edge 211 is a chamfered edge. The edge 211 corresponds to an angle between the lower part 111 and the upper part 112 of the upper element 11. The first secondary sealing part 22 projects from an inner side of the main sealing part 21 direction of the groove 14. The first secondary sealing portion 22 in the direction of the groove 14 comprises two edges 221. The two edges 221 are also chamfered edges. One of the two edges 221 corresponds to an angle between the lower portion 111 of the upper member 11 and the tie layer 12. The other of the two edges 221 corresponds to an angle between the tie layer 12 and the Bottom element 13. The chamfered edges help the elastomeric ring 20 to be arranged easily in the groove 14. Thus, the groove 14 can be completely filled and uniformly sealed by the elastomeric ring 20. Referring to FIG. In Figure 2, it can be seen that the electrostatic chuck 10 further comprises an extension member 30 around the side wall of the electrostatic chuck 10. There is a gap 31 between the electrostatic chuck 10 and the chuck element 10. Extension 30. The gap 31 is directly connected to the groove 14. Plasma gas 40 can destroy the bonding layer 12 through the gap 31 and the groove 14 in a plasma etching process. Erosion and leakage occur after the bonding layer 12 has been damaged by the plasma gas 40. Referring to FIG. 2, it can be seen that the second embodiment of the barrier seal is a ring elastomer 20A. The cross section of the elastomeric ring 20A is substantially L-shaped, and the elastomeric ring 20A has a shape corresponding to the groove 14. The elastomeric ring 20A comprises: a main sealing portion 21A, a first sealing portion secondary 22A and a second secondary sealing portion 23A. The main sealing portion 21A towards the groove 14 further comprises an edge 211A. The edge 211A is a chamfered edge. The edge 211A corresponds to an angle 15 between the lower portion 111 and the upper portion 112 of the upper member 11. The first secondary sealing portion 22A projects from an inner edge of the main sealing portion 21A in the direction of the groove 14. The first secondary sealing portion 22A in the direction of the groove 14 comprises two edges 221A. The two edges 221A are also chamfered edges. One of the two edges 221A corresponds to an angle between the lower part 111 of the upper element 11 and the bonding layer 12. The other of the two edges 221A corresponds to an angle between the bonding layer 12 and the Bottom element 13. The chamfered edges help the elastomeric ring 20A to be arranged easily in the groove 14. Thus, the groove 14 can be fully filled and sealed by the elastomeric ring 20A.
    [0009] The second secondary sealing portion 23A protrudes from an outer side of the main sealing portion 21A in a direction away from the groove 14. The second secondary sealing portion 23A is very thin. close to an interface between the main sealing portion 21A and the upper portion 112 of the upper member 11. The second secondary sealing portion 23A includes a chamfered edge 231A opposite the groove 14. The gap 31 between the electrostatic chuck 10 and the extension member 30 can be closed by the second secondary sealing portion 23A. The second secondary sealing portion 23A can prevent the plasma gas 40 from flowing in the gap 31 and the groove 14. The second secondary sealing portion 23A effectively prevents damage to the tie layer 12 caused by The present invention of the barrier seal is used for a sidewall of another type of electrostatic chuck 10A. Referring to Figure 3, it can be seen that another type of electrostatic chuck 10A includes an upper member 11A, a tie layer 12A and a lower member 13A. The upper member 11A has a lower portion 111A and an upper portion 112A.
    [0010] A diameter of the lower portion w11 is smaller than a diameter of the upper portion W11. The lower member 13A has an upper unit 131A and a lower unit 132A. A diameter w13 of the upper unit 131A is smaller than a diameter W13 of the lower unit 132A. The tie layer 12A is connected to the lower portion 111A of the upper member 11A and the upper unit 131A of the lower member 13A. A groove 14A is formed around an outer surface of the bonding layer 12A. The groove 14A is between the upper member 11A and the lower member 13A. Before filling the groove 14A with the barrier seal, a portion of the outer bonding layer 12A is removed to a depth D and a diameter w ".The diameter w" of the bonding layer is smaller than the diameter w11. from the lower part and to the diameter w13 of the upper unit. Thus, the cross section of the groove 14A is T-shaped with reference to Figs. 3, 4 and 5. With reference to Fig. 3, it can be seen that the third embodiment of FIG. barrier seal is an elastomeric ring 20B. The cross section of the elastomeric ring 20B is T-shaped, and the elastomeric ring 20B has a shape corresponding to the groove 14A. The elastomeric ring 20B comprises: a main sealing portion 21B and a first secondary sealing portion 22B. The main sealing portion 21B in the direction of the groove 14A further comprises two edges 211B. Both edges 211B are chamfered edges. One of the two edges 211B corresponds to an angle between the lower portion 111A and the upper portion 112A of the upper member 11A. The other of the two edges 211B corresponds to an angle between the upper unit 131A and the lower unit 132A of the lower member 13A. The first secondary sealing portion 22B projects from an inner side of the main sealing portion 21B toward the groove 14A. The first secondary sealing portion 22B in the direction of the groove 14A comprises two edges 221B. The two edges 221B are also chamfered edges. One of the two edges 221B corresponds to an angle between the lower portion 111A of the upper member 11A and the tie layer 12A. The other of the two edges 221B corresponds to an angle between the tie layer 12A and the upper unit 131A of the lower member 13A. The chamfered edges help the elastomeric ring 20B to be arranged more easily in groove 14A. Thus, the groove 14A can be completely filled and sealed by the elastomeric ring 20B. Referring to Figure 4, it can be seen that the electrostatic chuck 10A further comprises an extension member 30A around the side wall of the electrostatic chuck 10A. There is an interval 31A between the electrostatic chuck 10A and the extension member 30A. The gap 31A is directly connected to the groove 14A. Plasma gas 40 can destroy bonding layer 12A through gap 31A and groove 14A in a plasma etch process. Erosion and leakage occur after the tie layer 12A has been damaged by the plasma gas 40. Referring to FIG. 4, it can be seen that the fourth embodiment of the barrier seal is a ring elastomer 20C. The cross section of the elastomeric ring 20C is substantially T-shaped, and the elastomeric ring 20C has a shape corresponding to the groove 14A. The elastomeric ring 20C comprises: a main sealing portion 21C, a first secondary sealing portion 22C and a second secondary sealing portion 23C. The main sealing portion 21C towards the groove 14A further comprises two edges 211C. The two edges 211C are chamfered edges. One of the two edges 211C corresponds to an angle between the lower portion 111A and the upper portion 112A of the upper member 11A. The other of the two edges 211C corresponds to an angle between the upper unit 131A and the lower unit 132A of the lower member 13A. The first secondary seal portion 22C projects from an inner side of the main seal portion 21C toward the groove 14A. The first secondary sealing portion 22C toward the groove 14A includes two edges 2232C. The two edges 221C are also chamfered edges. One of the two edges 221C corresponds to an angle between the lower portion 111A of the upper member 11A and the tie layer 12A. The other of the two edges 221C corresponds to an angle between the tie layer 12A and the upper unit 131A of the lower member 13A. The chamfered edges help the elastomeric ring 20C to be easily disposed in the groove 14A. Thus, the groove 14A can be fully filled and sealed by the elastomeric ring 20C. The second secondary seal portion 23C projects from an outer side of the main seal portion 21C in a direction away from the groove 14A. The second secondary sealing portion 23C is very close to an interface between the main sealing portion 21C and the upper portion 112A of the upper member 11A. The second secondary sealing portion 23C includes a chamfered edge 231C opposite the groove 14A. The gap 31A between the electrostatic chuck 10A and the extension member 30A can be closed by the second secondary sealing portion 23C. The second secondary seal portion 23C can prevent the plasma gas 40 from flowing in the gap 31A and the groove 14A. The second secondary sealing portion 23C effectively prevents damage to the bonding layer 12A caused by the etching of the plasma gas 40. Referring to FIG. 5, it can be seen that the fifth embodiment of FIG. barrier seal is an elastomeric ring 20C '. The cross section of the elastomeric ring 20C 'is substantially T-shaped, and the elastomeric ring 20C' has a shape corresponding to the groove 14A. The elastomeric ring 20C 'comprises: a main sealing portion 21C', a first secondary sealing portion 22C ', and three members of the second secondary sealing portion 23C'. The main sealing portion 21C 'towards the groove 14A further comprises two edges 211C'. The two edges 211C 'are chamfered edges. One of the two edges 211C 'corresponds to an angle between the lower part 111A and the upper part 112A of the upper element 11A. The other of the two edges 211C 'corresponds to an angle between the upper unit 131A and the lower unit 132A of the lower member 13A. The first secondary sealing portion 22C 'protrudes from an inner side of the main sealing portion 21C' toward the groove 14A. The first secondary sealing portion 22C 'towards the groove 14A comprises two edges 221C'. The two edges 221C 'are also chamfered edges. One of the two edges 221C 'corresponds to an angle between the lower portion 111A of the upper member 11A and the tie layer 12A. The other of the two edges 221C 'corresponds to an angle between the bonding layer 12A and the upper unit 131A of the lower element 13A. The chamfered edges help the elastomeric ring 20C 'to be easily disposed in the groove 14A. Thus, the groove 14A can be fully filled and sealed by the elastomeric ring 20C '. The three elements of the second secondary sealing portion 23C 'project from an outer side of the main sealing portion 21C' in a direction away from the groove 14A. The three members of the second secondary sealing portion 23C 'are respectively formed at an upper position, a central position and a lower position on the outer side of the main sealing portion 21C'. Each of the three elements of the second secondary sealing portion 23C 'comprises a chamfered edge 231C' opposite the groove 14A. The gap 31A between the electrostatic chuck 10A and the extension member 30A can be closed by the three elements of the second secondary sealing portion 23C '. The three elements of the second secondary sealing portion 23C 'can prevent the plasma gas 40 from flowing into the space 31A and the groove 14A. The three elements of the second secondary sealing portion 23C 'effectively prevent damage to the bonding layer 12A caused by the etching of the plasma gas 40. The number of elements on the second secondary sealing portion 23C' n ' is not limited to three. The mounting positions of the three members on the second secondary sealing portion 23C 'are not limited to the upper position, the central position and the lower position on the outer side of the main sealing portion 21C', respectively. The engineers can selectively change the numbers and mounting positions of the members on the second secondary seal portion 23C '. Referring to Figure 6, it can be seen that the sixth embodiment of the barrier seal is an elastomeric ring 20D. The cross-section of the elastomeric ring 20D is substantially T-shaped. The elastomeric ring 20D comprises: a main sealing portion 21D, a first secondary sealing portion 22D, and a third secondary sealing portion 24D. The main sealing portion 21D toward the groove 14A further comprises two edges 211D. Both edges 211D are chamfered edges. One of the two edges 211D corresponds to an angle between the lower portion 111A and the upper portion 112A of the upper member 11A.
    [0011] The other of the two edges 211D corresponds to an angle between the upper unit 131A and the lower unit 132A of the lower element 13A. The first secondary sealing portion 22D protrudes from an inner side of the main sealing portion 21D toward the groove 14A. The first secondary sealing portion 22D towards the groove 14A comprises two edges 221D. The two edges 221D are also chamfered edges. One of the two edges 221D corresponds to an angle between the lower portion 111A of the upper member 11A and the tie layer 12A. The other of the two edges 221D corresponds to an angle between the bonding layer 12A and the upper unit 131A of the lower element 13A. The chamfered edges help the elastomeric ring 20D to be easily disposed in the groove 14A. Thus, the groove 14A can be fully filled and sealed by the elastomeric ring 20D. The third secondary seal portion 24D protrudes from an outer side of the main seal portion 21D in a direction away from the groove 14A. A height H of the third secondary sealing portion 24D is greater than a height h of the main sealing portion 21D, and the third secondary sealing portion 24D is in contact with the upper portion 112A of the upper member 11A and lower unit 132A of lower member 13A, respectively. The gap 31A between the electrostatic chuck 10A and the extension member 30A can be closed by the third secondary sealing portion 24D.
    [0012] The third secondary sealing portion 24D can prevent the plasma gas 40 from flowing in the gap 31A and the groove 14A. The third secondary sealing portion 24D effectively prevents damage to the bonding layer 12A caused by the etching of the plasma gas 40. Referring to Fig. 7, the seventh embodiment of the barrier seal is an elastomeric ring 20E. The cross section of the elastomeric ring 20E is in the form of a cap. The elastomeric ring 20E comprises: a main sealing portion 21E and a third secondary sealing portion 24E. The main sealing portion 21E towards the groove 14A further comprises two edges 211E. The two edges 211E are chamfered edges. One of the two edges 211E corresponds to an angle between the lower portion 111A and the upper portion 112A of the upper member 11A. The other of the two edges 211E corresponds to an angle between the upper unit 131A and the lower unit 132A of the lower member 13A. The third secondary sealing portion 24E projects from an outer side of the main sealing portion 21E in a direction away from the groove 14A. A height H1 of the third secondary sealing portion 24E is larger than a height h1 of the main sealing portion 21E, and the third secondary sealing portion 24E is in contact with the upper portion 112A of the upper member 11A and lower unit 132A of lower member 13A, respectively. The gap 31A between the electrostatic chuck 10A and the extension member 30A can be closed by the third secondary sealing portion 24E. The third secondary sealing portion 24E can prevent the plasma gas 40 from flowing in the gap 31A and the groove 14A. The third secondary sealing portion 24E effectively prevents damage to the bonding layer 12A caused by the etching of the plasma gas 40.
    [0013] Referring to Figure 8, it can be seen that the eighth embodiment of the barrier seal is an elastomeric ring 20E '. The cross section of the elastomeric ring 20E 'is substantially in the form of a cap. The elastomeric ring 20E 'comprises: a main sealing portion 21E' and a third secondary sealing portion 24E '. The main sealing portion 21E 'towards the groove 14 further comprises two edges 211E'. Both edges 211E 'are chamfered edges. One of the two edges 211E 'corresponds to an angle between the lower part 111 and the upper part 112 of the upper element 11. The other of the two edges 211E' is very close to an upper surface of the lower element 13. The third secondary sealing portion 24E 'projects from an outer side of the main sealing portion 21E' in a direction away from the groove 14. A height H2 of the third portion the secondary seal 24E 'is larger than a height h2 of the main seal portion 21E', and the third secondary seal portion 24E 'is in contact with the upper portion 112 of the upper member 11 and the lower element 13, respectively. The gap 31 between the electrostatic chuck 10 and the extension member 30 may be closed by the third secondary sealing portion 24E '. The third secondary sealing portion 24E 'can prevent the plasma gas 40 from flowing in the gap 31 and the groove 14. The third secondary sealing portion 24E' effectively prevents damage to the tie layer 12 caused by the etching of the plasma gas 40. The differences between the elastomeric ring 20E and the elastomeric ring 20E 'are the height h1, h2 of the main sealing portion and the height H1, H2 of the third sealing portion 3032768 secondary. Different arrangements of the lower member 13, 13A may be used with the elastomeric ring 20E 'or the elastomer ring 20E, respectively, with reference to Figures 7 and 8. The engineers may select the elastomer ring 20E or the elastomer ring 20E' suitable for use with the various electrostatic chucks 10. All types of elastomeric rings 20, 20A, 20B, 20C, 20C ', 20D, 20E, 20E' are made of rubber. The elastic property of the rubber can help the elastomeric ring 20, 20A, 20B, 20C, 20C ', 20D, 20E, 20E' to be disposed in the groove 14, 14A evenly and completely. The elastomeric ring 20, 20A, 20B, 20C, 20C ', 20D, 20E, 20E' can effectively prevent damage to the bonding layer 12, 12A caused by the etching of the plasma gas 40. In summary, the barrier seal for a side wall of the electrostatic chuck 10 uses multiple sealing portions, such as double or triple sealing portions, to prevent the plasma gas 40 from flowing into the groove 14, 14A or the gaps 31, 31A to damage the bonding layer 12, 12A. Even if one of the multiple sealing portions is destroyed by the plasma gas 40, gas leakage from the electrostatic chuck 10, 10A will not occur. Engineers can replace the damaged barrier seal in time before the leak. The present invention is beneficial for the development of the semiconductor industry. 30
    权利要求:
    Claims (13)
    [0001]
    CLAIMS1 - A barrier seal for use on an electrostatic chuck (10), the electrostatic chuck (10) comprising an upper member (11), a lower member (13), a tie layer (12) connecting the upper member ( 11) and the lower member (13), and a groove (14) formed from an outer edge of the tie layer (12), the upper member (11) and the lower member (13), the barrier joint characterized by being an elastomeric ring (20) and comprising a main sealing portion (21) and at least one secondary sealing portion projecting outwardly from one side of the main sealing portion (21), the main sealing portion (21) comprising at least one edge (211) towards the groove (14) and a side of the at least one edge (211) being a chamfered edge.
    [0002]
    2 - Electrostatic chuck barrier seal (10) according to claim 1, characterized in that one side of the main sealing portion (21) in the direction of the groove (14) comprises an edge (211), the edge (211) being a chamfered edge, and the barrier seal comprises a first secondary sealing portion (22), which protrudes from an inner side of the main sealing portion (21) toward the groove ( 14).
    [0003]
    3 - Electrostatic chuck barrier seal (10) according to claim 2, characterized in that one side of the first secondary sealing portion (22) in the direction of the groove (14) comprises two edges (221), the two edges (221) being chamfered edges. 3032768 23
    [0004]
    4 - Barrier joint for electrostatic chuck (10) according to claim 2 or 3, characterized in that the barrier seal comprises at least a second secondary sealing portion (23A), the at least one second sealing portion 5 secondary member (23A) projecting from an outer side of the main sealing portion (21A) in a direction away from the groove (14).
    [0005]
    5 - electrostatic chuck barrier seal 10 (10) according to claim 4, characterized in that the at least one second secondary sealing portion (23A) comprises a chamfered edge (231A) in a direction opposite to the groove (14).
    [0006]
    6 - Barrier joint for electrostatic chuck 15 (10) according to any one of claims 2 to 5, characterized in that the cross section of the barrier joint is L-shaped.
    [0007]
    An electrostatic chuck barrier seal (10A) according to claim 1, characterized in that one side of the main sealing portion (21B) towards the groove (14A) comprises two edges (211B), the two edges (211B) being chamfered edges, and that the barrier seal comprises a first secondary sealing portion (22B), which protrudes from an inner side of the main sealing portion (21B) towards the groove (14A).
    [0008]
    8 - Electrostatic chuck barrier seal (10A) according to claim 7, characterized in that one side of the first secondary sealing portion (22B) in the direction of the groove (14A) comprises two edges (221B), the two edges (221B) being chamfered edges.
    [0009]
    9 - Electrostatic chuck barrier seal (10A) according to claim 7 or 8, characterized in that the barrier seal comprises at least a second secondary sealing portion (23C), the at least one second portion of secondary seal (23C) projecting from an outer side of the main seal portion (21C) in a direction away from the groove (14A).
    [0010]
    10 - Barrier joint for an electrostatic chuck (10A) according to claim 9, characterized in that the at least one second secondary sealing portion (23C) comprises a chamfered edge (231C) opposite the groove ( 14A).
    [0011]
    11 - Barrier joint for electrostatic chuck (10A) according to any one of claims 7 to 10, characterized in that the cross section of the barrier joint is T-shaped.
    [0012]
    12 - Barrier joint for electrostatic chuck (10A) according to claim 7 or 8, characterized in that the barrier seal further comprises a third secondary sealing portion (24D), which protrudes 20 from an outer side the main sealing portion (21D) in a direction opposite the groove (14A), a height (H) of the third secondary sealing portion (24) being greater than a height (hl) of the main sealing portion (21D), and the third secondary sealing portion (24D) being in contact with the upper member (11A) and the lower member (13A) of the electrostatic mandrel (10A), respectively .
    [0013]
    13 - electrostatic chuck barrier seal (10, 10A) according to claim 1, characterized in that one side of the main sealing portion (21E, 21E ') in the direction of the groove (14, 14A) comprises two edges (211E, 211E '), the two edges (211E, 211E') being chamfered edges, and that the barrier seal further comprises a third secondary sealing portion (24E, 24E '), which protrudes from an outer side of the main sealing portion (21E, 21E ') in a direction opposite the groove (14, 14A), a height (H1, H2) of the third portion of secondary sealing (24E, 24E ') being greater than a height (h1, h2) of the main sealing portion (21E, 21E'), and the third secondary sealing portion (24E, 24 ') being in contact with the upper element (11, 11A) and the lower element (13, 13A) of the electrostatic chuck (10, 10A), respectively.
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    同族专利:
    公开号 | 公开日
    CN105895570B|2018-11-02|
    JP2016152414A|2016-08-22|
    DE202016008428U1|2017-12-04|
    TWI613753B|2018-02-01|
    KR20160100841A|2016-08-24|
    KR101854973B1|2018-05-04|
    US20160240421A1|2016-08-18|
    CN105895570A|2016-08-24|
    DE102016101751A1|2016-08-18|
    FR3032768B1|2018-09-07|
    JP6195636B2|2017-09-13|
    US10529611B2|2020-01-07|
    SG10201600659UA|2016-09-29|
    TW201631695A|2016-09-01|
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    法律状态:
    2016-12-22| PLFP| Fee payment|Year of fee payment: 2 |
    2018-01-30| PLFP| Fee payment|Year of fee payment: 3 |
    2018-03-23| PLSC| Publication of the preliminary search report|Effective date: 20180323 |
    2020-01-22| PLFP| Fee payment|Year of fee payment: 5 |
    2020-12-16| PLFP| Fee payment|Year of fee payment: 6 |
    2021-12-16| PLFP| Fee payment|Year of fee payment: 7 |
    优先权:
    申请号 | 申请日 | 专利标题
    TW104105259A|TWI613753B|2015-02-16|2015-02-16|Improved seal for electrostatically adsorbing the side wall of the retainer|
    TW104105259|2015-02-16|
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